Quartz Tube Semiconductor Grade Clear Fused Silica For Diffusion Furnace Wafer Process Vacuum Sealing Laboratory Custom Size
Detail Produk
| Kepadatan: | 2.2g/cm3 | Titik Leleh: | 1750-1850 ℃ |
|---|---|---|---|
| Titik anil: | 1180 ℃ | Bahan: | SiO2> 99,99% |
| Titik regangan: | 1100℃ | Kekerasan: | Morse 6.5 |
Deskripsi Produk
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